Laser Nanofactory – Multi-Photon Polymerisation, Laser Etching

Features & Benefits:

  • Additive and subtractive techniques combined in one Laser Nanofactory system
  • Arbitrary-shaped 3D structures from micrometers to centimeters scale
  • Fast switch from additive to subtractive microfabrication
  • Self-alignment system for automatic laser beam alignment
  • Customizable configuration – integrate additional devices

The Laser Nanofactory by Femtika combines additive and subtractive manufacturing, which allows for the fabrication of complex micro-devices of several different materials, serving a wide range of industries including microelectronics, medical devices, and aerospace engineering.

Multiphoton-polymerization (MPP) is a technology that enables the production of arbitrary shape polymeric structures within submicrometric resolution. MPP has become a popular choice in the manufacturing of microelectronic devices due to its exceptional ability to produce intricate and precise structures. Its highly focused light source also enables the creation of complex 3D shapes with ease.

Key Specifications:
Technology Additive manufacturing
Materials SZ2080, SU-8, Ormocers, Glassomer, hybrid organic-inorganic photopolymers, elastomers, proteins
Minimum XY feature size 150 nm
Minimum surface roughness Ra ≤ 20 nm
Maximum fabrication speed 30 mm/s

Selective laser etching (SLE) is a subtractive laser technology allowing fabrication of complex-shape 3D glass parts with micrometer precision. This technology consists of two fabrications steps: femtosecond laser irradiation and subsequent chemical etching. SLE is often used in the manufacturing of electronic devices and other precision components, as it allows for high levels of accuracy and detail in the etched patterns. Additionally, because the laser beam is highly focused, it can be used to etch very small and intricate designs.

Key Specifications:
Technology Substractive manufacturing
Materials Fused silica, Borosilicate glass
Smallest feature size > 1 μm
Minimum surface roughness < 200 nm
Maximum object height 1 cm
Aspect ratio > 1 : 200
Minimum micro hole diameter 5 µm
Writing speed 50 mm/s

Laser Nanofactory workstation allows hybrid fabrication, meaning that various processes are supported by the same equipment. The two of  most frequently used processes are multiphoton polymerization and selective glass etching. By precisely tuning its parameters the same machine is capable to perform more processes including:

    • Refractive index modification of transparent materials
    • Micro-ablation
    • Surface structuring
    • Micro-welding

Femtika also offers contract manufacturing services including feasibility studies and small scale manufacturing. For further details and product datasheet, please check here.

Please contact us to know how the Femtika Laser Nanofactory can help you in your laser micro fabrication requirements or to request a quotation.

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